3 Review(s)

Ideal for upper-level undergraduate or first-year graduate courses and as a handy reference for professionals, The Science and Engineering of Microelectronic Fabrication, Second Edition, provides a thorough and accessible introduction to the field of micro-fabrication. Revised and expanded in this second edition, the text covers all the basic unit processes used to fabricate integrated circuits, including photo lithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vapor phase epitaxial growth, sputtering, and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, next generation lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacture of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance trade offs are evaluated along with a description of current state-of-the-art devices. Each chapter includes sample problems with solutions. The text makes use of the popular process simulation package SUPREM to provide more meaningful examples of the type of real-world dopant redistribution problems that microelectronic fabrication engineers must face. This new edition includes a chapter on micro-electromechanical structures (MEMS), an exciting new area in micro-fabrication. The coverage of MEMS includes fundamentals of mechanics; stress in thin films; mechanical to electrical transduction; mechanics of common MEMS devices; bulk micro-machining etching techniques; bulk micro-machining process flow; surface micro-machining basics; surface micro-machining process flow; MEMS actuators; and high aspect ratio micro-systems technology (HARMST).